NtryMed

NTRYMED Exfoliating Polish 150ml

R 350.00 ZAR
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NTRYMED Exfoliating Polish is a nourishing mechanical exfoliator formulated to refine rough or uneven texture without the stripped feeling often associated with traditional facial scrubs.

Fine Magnesium Oxide provides the physical polishing action, helping remove accumulated dull surface cells as the product is gently massaged over the skin.

A cushioning cream base containing Glycerin, Mineral Oil, Caprylic/Capric Triglyceride and Squalane helps maintain softness and comfort during exfoliation, while Ascorbyl Glucoside, Vitamin E, Centella Asiatica, Green Tea and Licorice provide complementary antioxidant and skin-conditioning support.

Benefits:

  • Provides controlled mechanical exfoliation
  • Helps remove accumulated dull surface cells
  • Helps refine rough texture
  • Leaves skin feeling smoother
  • Helps soften flaky surface build-up
  • Supports a brighter, fresher-looking complexion
  • Helps improve visible radiance
  • Creates a smoother skin surface
  • Provides cushioning emollient support during exfoliation
  • Helps minimise the stripped feeling associated with some scrubs
  • Contains Magnesium Oxide
  • Contains Squalane
  • Contains Glycerin
  • Contains stabilised Vitamin C
  • Contains Vitamin E
  • Contains Centella Asiatica
  • Contains Green Tea
  • Contains Licorice Root
  • Includes a broad botanical antioxidant complex
  • Designed for use approximately 2–3 times weekly

 

Magnesium Oxide
The principal physical polishing ingredient within NTRYMED Exfoliating Polish.
Magnesium Oxide is a mineral material used in facial polishing products to provide controlled mechanical exfoliation as the product is massaged over the skin.
Its role is to help:
Lift dull surface build-up + smooth rough texture + improve immediate softness.
For Chris & Alley, I would make Magnesium Oxide the clear hero exfoliating technology rather than vaguely describing the product as a generic scrub.
Glycerin
A well-established humectant that attracts water and helps support skin hydration.
Its position high in the formula helps balance the physical exfoliating action and maintain a more comfortable skin feel.
Squalane
A lightweight, skin-compatible emollient that helps replenish softness and reduce the dry or tight feeling that can sometimes follow exfoliation.
Caprylic/Capric Triglyceride
A lightweight emollient that helps cushion the polishing particles while supporting softness and spreadability.
Mineral Oil
An effective occlusive and emollient ingredient that helps reduce moisture loss and creates the rich, cushioning texture of the polish.
Its presence is one reason this formula behaves differently from a dry or abrasive granular scrub.
Ascorbyl Glucoside
A stabilised Vitamin C derivative providing:
Antioxidant support + visible radiance + complexion support.
It is a complementary ingredient rather than the primary exfoliating mechanism.
Tocopheryl Acetate / Vitamin E
Provides antioxidant and skin-conditioning support.
It complements the emollient system and helps reinforce the formula's nourishing profile.
Centella Asiatica Extract
Provides soothing and skin-conditioning support, helping maintain comfort during exfoliation.
Camellia Sinensis / Green Tea Extract
Provides antioxidant polyphenols and complementary skin-conditioning benefits.
Glycyrrhiza Glabra / Licorice Root Extract
Provides soothing and complexion-supportive benefits, making it particularly useful within a formula aimed at dull or uneven-looking skin.
Polygonum Cuspidatum Root Extract
Provides additional botanical antioxidant support.
Scutellaria Baicalensis Root Extract
Provides complementary antioxidant and conditioning benefits.
Chamomile Extract
Helps support skin comfort and visible soothing.
Rosemary Leaf Extract
Provides additional antioxidant support within the botanical blend.
Triticum Aestivum / Wheat Seed Extract
A botanical conditioning ingredient that contributes to the formula's nourishing profile.
Aspergillus Ferment
A ferment-derived skin-conditioning ingredient.
Ferment-derived ingredients may contribute complementary surface-renewal and conditioning benefits, but for this particular product I would not position Aspergillus Ferment as the main exfoliant.
The clear and verifiable exfoliating mechanism is the Magnesium Oxide mechanical polish.

Use approximately 2–3 times per week.
After cleansing, apply a small amount to clean, damp skin.
Using light fingertip pressure, gently massage in circular motions over the:
Face + Neck
for a short period, concentrating on areas of roughness or dull surface build-up.
Avoid:
The immediate eye area
Open or broken skin
Actively irritated areas
Aggressive rubbing
Rinse thoroughly with lukewarm water.
Pat the skin dry and continue with your chosen serum and moisturiser.
Important
With a physical exfoliator:
More pressure does not mean better exfoliation.
Allow the polishing particles and formula to do the work.
If the skin feels tender, persistently red or uncomfortable afterward, reduce frequency or stop use until the skin has recovered.

Dull skin
Rough or uneven texture
Dry surface build-up
Flaky-looking skin
Skin lacking smoothness
Skin lacking radiance
Normal skin
Combination skin
Oily skin
Dry or dehydrated skin where physical exfoliation is tolerated
Mature skin
Uneven-looking complexion
Clients preferring a rinse-off exfoliator
Clients wanting occasional mechanical exfoliation
Pigmentation routines requiring careful removal of dull surface build-up
Age-prevention routines
Sensitive skin where gentle mechanical exfoliation is comfortably tolerated

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NTRYMED Exfoliating Polish 150ml

NTRYMED Exfoliating Polish 150ml

R 350.00 ZAR

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